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dc.contributor.authorMaghanga, C. M.
dc.contributor.authorJensen, J
dc.contributor.authorNiklasson, G. A
dc.contributor.authorGranqvist, C. G
dc.date.accessioned2023-02-24T07:54:02Z
dc.date.available2023-02-24T07:54:02Z
dc.date.issued2010-11
dc.identifier.urihttp://ir.kabarak.ac.ke/handle/123456789/1447
dc.description.abstractTransparent and conducting thin films of TiO2:Nb were prepared on glass and aluminum substrates by dual-target reactive DC magnetron sputtering in an Ar + O2 plasma. The Nb content lay between zero and 4.9 at. % as determined by ion beam analyses. X-ray diffraction showed that vacuum annealing at 450 °C led to crystallinity and prevalence of the anatase structure. The influence of Nb doping was studied with regard to structural, optical, and electrical data. Optical constants were determined from spectrophotometric recordings for films on glass, and the onset of free-electron behavior was documented for annealed films. The latter films, deposited onto Al2O3-coated Al, were found to display optically selective reflectance and to be useful for solar energy applicationsen_US
dc.language.isoenen_US
dc.publisherKabarak Universityen_US
dc.subjectAnalysis of optical propertien_US
dc.subjectFilm characterizationen_US
dc.subjectFilm depositionen_US
dc.titleTransparent and Conducting TiO2:Nb Films Made by Sputter Deposition: Application to Spectrally Selective Solar Reflectorsen_US
dc.typeArticleen_US


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